Scripted HTML version of Foils prepared 29 August 1995

Foil 113 Advanced Simulation of Chemically Reacting Flows

From Initial CPS615 Course and Parallel Computing Overview CPS615 Basic Simulation Track for Computational Science -- Fall Semester 95. by Geoffrey C. Fox *
View of fluid streamlines and the center plane temperature distribution in a vertical disk, chemical vapor deposition reactor. Simulations such as these allow designers to produce higher uniformity semiconductor materials by eliminating unwanted detrimental effects such as fluid recirculation.

© Northeast Parallel Architectures Center, Syracuse University, npac@npac.syr.edu

If you have any comments about this server, send e-mail to webmaster@npac.syr.edu.

Page produced by wwwfoil on Thu Aug 14 1997